Intel deploys ASML's high NA tool for Panther Lake chips

Intel has started using a next-generation lithography machine from ASML to manufacture part of its flagship Panther Lake laptop chips, ASML confirmed Tuesday. The move marks a step forward for a technology the industry has spent years debating whether to adopt.

The machine in question uses high numerical aperture (high NA) extreme ultraviolet (EUV) technology to print circuit patterns onto microchips. Intel began experimenting with the tool in 2024 and has now moved to using it for specific layers of its Panther Lake processors rather than just testing it in isolation.

Lithography is the process of using light to etch the intricate circuit patterns that make up a chip. Intel already relies on ASML's standard EUV machines for this work, but the High NA version is designed to handle even smaller, more precise features as chips continue to shrink.

The high NA device is priced at around $400 million, which is almost double the cost of an EUV device and requires extensive efforts for its installation into the production line. The use of this device by Intel and ASML on the selected layers of Panther Lake helps improve the performance of the High NA tool using the real production data.

Intel did not offer any comments regarding the announcement, making ASML the only source of information about the release of this device.

Panther Lake chips are manufactured using the 18A technology node that represents the latest technology node of Intel. Intel obtained its first High NA device in 2024 at its research and development facility in Hillsboro, Oregon.